An optimization approach for 3D photolithography utilizing DMD maskless exposure system

Conference paper (2014)

Authors

X. Ma Computational Design and Mechanics
Y Kato External organisation
Y Hirai External organisation
Floris van Kempen Computational Design and Mechanics
Fred Keulen Computational Design and Mechanics
T Tsuchiya External organisation
O Tabata External organisation
Research Group
Computational Design and Mechanics
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Published Date

2014

Language

English

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Research Group

Computational Design and Mechanics

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