An optimization approach for 3D photolithography utilizing DMD maskless exposure system
Conference Paper
(2014)
Author(s)
X Ma (TU Delft - Computational Design and Mechanics)
Y Kato (External organisation)
Y Hirai (External organisation)
Floris van Kempen (TU Delft - Computational Design and Mechanics)
F Van Keulen (TU Delft - Computational Design and Mechanics)
T Tsuchiya (External organisation)
O Tabata (External organisation)
Research Group
Computational Design and Mechanics
To reference this document use:
https://resolver.tudelft.nl/uuid:d51bb1be-71db-47b8-b420-0da069253ac5
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Publication Year
2014
Language
English
Research Group
Computational Design and Mechanics
Pages (from-to)
1-6
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