Fv
F.C.M. van Kempen
Authored
15 records found
The stringent and conflicting requirements imposed on optomechanical instruments and the ever-increasing need for higher resolution and quality imagery demands a tightly integrated system design approach. Our aim is to drive the thermomechanical design of multiple components thro
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Digital Micromirror Device (DMD)-based grayscale lithography is a promising tool for three dimensional (3D) microstructuring of thick-film photoresist since it is a maskless process, provides possibility for the free-form of 3D microstructures, and therefore rapid and cost-effect
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We report a multiple patterning approach utilizing
digital-micromirror-device (DMD)-based grayscale lithography, providing a
solution to improve fabrication accuracy for entire target
three-dimensional structure. Because DMD-based lithography system
consists a projection lens
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A novel process optimization tool for grayscale lithography is developed and demonstrated to fabricate three-dimensional (3D) microstructures using thick-film photoresists. For the first time, the two process parameters in grayscale lithography: exposure dose profile and
developm
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Digital micromirror device (DMD)-based grayscale lithography is a promising tool for 3-D photolithography of thick photoresists, because this technique provides a patterning solution for free-form 3-D microstructures. Among the numerous process parameters in DMD-based grayscale l
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Digital micromirror device (DMD)-based grayscale lithography is a promising tool for 3-D photolithography of thick photoresists, because this technique provides a patterning solution for free-form 3-D microstructures. Among the numerous process parameters in DMD-based grayscale l
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With the ongoing development of thick photoresists, promising possibilities have
emerged to use these transparent and flexible layers for micro-structures and micropatterns directly and not exclusively as a sacrificial layer in the processing. These 3D
polymer microstructures hav
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With the ongoing development of thick photoresists, promising possibilities have
emerged to use these transparent and flexible layers for micro-structures and micropatterns directly and not exclusively as a sacrificial layer in the processing. These 3D
polymer microstructures hav
...
Contributed
1 records found
The stringent and conflicting requirements of optomechanical instruments and the ever-increasing need for higher resolution and quality imagery demands a tightly integrated design approach. The aim of this study is to drive the thermomechanical design of multiple components of an
...