Multiple patterning with process optimization method for maskless DMD-based grayscale lithography
X Ma (Kyoto University)
Y Kato (Kyoto University)
Floris van Kempen (TU Delft - Computational Design and Mechanics)
Y Hirai (Kyoto University)
T Tsuchiya (Kyoto University)
Fred van Keulen (TU Delft - Computational Design and Mechanics)
O Tabata (Kyoto University)
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Abstract
We report a multiple patterning approach utilizing
digital-micromirror-device (DMD)-based grayscale lithography, providing a
solution to improve fabrication accuracy for entire target
three-dimensional structure. Because DMD-based lithography system
consists a projection lens system, better resolution can be obtained
around focal position comparing to the outer region of depth of focus.
Thus, for thick-film resist micro structuring, exposing with multiple
focal positions with separate grayscale masks leads to improvement of
fabrication accuracy. In order to find the best combination of the
multiple focal positions and their grayscale masks, the computational
optimization is combined to the multiple patterning approach. Through a
several experiments, effectiveness of the proposed approach was
successfully demonstrated.
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