Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimization.

Journal Article (2001)
Author(s)

NN Iossad (TU Delft - QN/Fysics of NanoElectronics)

BD Jackson (TU Delft - QN/Fysics of NanoElectronics)

SN Polyakov (External organisation)

PN Dmitriev (External organisation)

T. M. Klapwijk (TU Delft - QN/Fysics of NanoElectronics)

Research Group
QN/Fysics of NanoElectronics
More Info
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Publication Year
2001
Research Group
QN/Fysics of NanoElectronics
Issue number
4
Volume number
19
Pages (from-to)
1840-1845

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