Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimization.
Journal Article
(2001)
Author(s)
NN Iossad (TU Delft - QN/Fysics of NanoElectronics)
BD Jackson (TU Delft - QN/Fysics of NanoElectronics)
SN Polyakov (External organisation)
PN Dmitriev (External organisation)
T. M. Klapwijk (TU Delft - QN/Fysics of NanoElectronics)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:d590393f-fc1d-450f-b0ba-77f28803ff38
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Publication Year
2001
Research Group
QN/Fysics of NanoElectronics
Issue number
4
Volume number
19
Pages (from-to)
1840-1845
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