Sub- 10-nm structures written in ultra-thin HSQ resist layers, using Electron Beam Lithography
Journal Article
(2007)
Author(s)
AE Grigorescu (TU Delft - ImPhys/Charged Particle Optics)
M.C. van der Krogt (TU Delft - QN/Kavli Nanolab Delft)
Kees Hagen (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
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https://resolver.tudelft.nl/uuid:d687fdbe-79fc-4d2b-a58d-f96f1f53e7bc
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Publication Year
2007
Research Group
ImPhys/Charged Particle Optics
Volume number
6519
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