Location and crystallographic orientation control of Si grains through combined metal induced lateral crystalization and mu-Czochralski process
Conference Paper
(2008)
Author(s)
C Tao (External organisation)
R. Ishihara (TU Delft - Electronic Components, Technology and Materials)
W Metselaar (External organisation)
Kees Beenakker (TU Delft - Electronic Components, Technology and Materials)
M. Wu (QN/High Resolution Electron Microscopy)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:d82eddd0-5153-40da-9552-eb011e9ca58d
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Publication Year
2008
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
1880-1883
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