Location and crystallographic orientation control of Si grains through combined metal induced lateral crystalization and mu-Czochralski process

Tao, C; Ishihara, R; Metselaar, W; Beenakker, C. W J; Wu, M.

Location and crystallographic orientation control of Si grains through combined metal induced lateral crystalization and mu-Czochralski process

Conference paper (2008)

Authors

C Tao External organisation

R Ishihara Electronic Components, Technology and Materials

W Metselaar External organisation

C. W J Beenakker Electronic Components, Technology and Materials

M. Wu

Research Group

Electronic Components, Technology and Materials

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Published Date

2008

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Research Group

Electronic Components, Technology and Materials

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