Copper for IC-applications. Mechanical reliability of CVD copper films
Report
(1996)
Author(s)
JF Jongste (External organisation)
JP Lokker (TU Delft - QN/Fysics of NanoElectronics)
GCAM Janssen (TU Delft - OLD Metals Processing, Microstructures and Properties)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
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Publication Year
1996
Research Group
QN/Fysics of NanoElectronics
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