Material-resolved and thickness-sensitive lensless imaging using high-harmonic generation
From diffractive shear interferometry to ptychography
Fengling Zhang (Vrije Universiteit Amsterdam, Advanced Research Center for Nanolithography, Amsterdam, TU Delft - Applied Sciences)
Xiaomeng Liu (Vrije Universiteit Amsterdam, Advanced Research Center for Nanolithography, Amsterdam)
Antonios Pelekanidis (Advanced Research Center for Nanolithography, Amsterdam, Vrije Universiteit Amsterdam)
Matthias Gouder (Vrije Universiteit Amsterdam, TU Delft - Applied Sciences, Advanced Research Center for Nanolithography, Amsterdam)
Kjeld Eikema (Vrije Universiteit Amsterdam, Advanced Research Center for Nanolithography, Amsterdam)
Stefan Witte (Vrije Universiteit Amsterdam, Advanced Research Center for Nanolithography, Amsterdam, TU Delft - Applied Sciences)
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Abstract
Microscopy with table-top high-harmonic generation (HHG) sources enable high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. However, accurate characterization of dispersive samples in terms of composition and thickness remains challenging due to the limitations of lens-based optics in this spectral range. Here, we performed spectrally resolved lensless imaging using multiple high harmonics. The diffractive shearing interferometry reconstruction serves as a foundational step for element-sensitive metrology, while ptychographic reconstruction enabled the retrieval of high-precision spectral imaging and quantitative thickness mapping. Our non-destructive method offers a powerful tool to extract both the material composition and layer thicknesses of complex nanostructured samples.