FZ
F. Zhang
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1
We show how to utilize ptychographic measurements in reflection, to obtain maps of height and complex refractive indices, using visible and extreme ultraviolet light sources. This technique enables flexible, high-resolution imaging of multi-element microstructures.
Microscopy with extreme ultraviolet (EUV) radiation enables high-resolution imaging with excellent material contrast because of the short wavelength and numerous element-specific absorption edges available in this spectral range. Table-top high-harmonic generation (HHG) sources o
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Material-resolved and thickness-sensitive lensless imaging using high-harmonic generation
From diffractive shear interferometry to ptychography
Microscopy with table-top high-harmonic generation (HHG) sources enable high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. However, accurate characterization of dis
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