Quantitative optical imaging is an important diagnostic tool for metrology and materials science. Especially in the extreme ultraviolet wavelength range, the combination of high spatial resolution and sensitivity to material properties holds promise for quantitative characterization of complex nanostructures. Unlocking this potential requires an approach that links the relevant material properties to optically measurable observables in a spatially resolved way. Here we show that high-resolution maps of the complex refractive index of a multi-element nanostructure can be reconstructed from polarization-resolved extreme ultraviolet ptychography measurements. We record ptychography data in a reflection geometry for two incident polarization states and variable angle of incidence, and show that the resulting amplitude and phase information can be analysed to yield accurate maps of the local refractive index and surface profile, using an automatic-differentiation-based reconstruction framework. Our approach enables determination of local material composition through a segmentation analysis, as well as high-resolution quantitative imaging of optically addressable properties of nanostructures.

Microscopy with table-top high-harmonic generation (HHG) sources enable high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. However, accurate characterization of dispersive samples in terms of composition and thickness remains challenging due to the limitations of lens-based optics in this spectral range. Here, we performed spectrally resolved lensless imaging using multiple high harmonics. The diffractive shearing interferometry reconstruction serves as a foundational step for element-sensitive metrology, while ptychographic reconstruction enabled the retrieval of high-precision spectral imaging and quantitative thickness mapping. Our non-destructive method offers a powerful tool to extract both the material composition and layer thicknesses of complex nanostructured samples.

We show how to utilize ptychographic measurements in reflection, to obtain maps of height and complex refractive indices, using visible and extreme ultraviolet light sources. This technique enables flexible, high-resolution imaging of multi-element microstructures.

Microscopy with extreme ultraviolet (EUV) radiation enables high-resolution imaging with excellent material contrast because of the short wavelength and numerous element-specific absorption edges available in this spectral range. Table-top high-harmonic generation (HHG) sources offer the additional advantage of generating wide spectra in the EUV and soft X-ray range, making them inherently well-suited for characterizing nanostructures. As lens-based EUV imaging is challenging, lensless imaging methods based on coherent diffraction offer practical advantages and can even allow for quantitative phase measurements of object transmission functions. Here, spectrally resolved lensless imaging of a dispersive sample is performed using multiple high harmonics based on different HHG-based measurement concepts. We characterize the structure and composition of a three-element spiral-shaped object in transmission using multiwavelength diffractive shearing interferometry, as well as single-wavelength structured-illumination ptychography. We find that both methods are capable of retrieving spatially resolved element maps and the corresponding layer thicknesses. Comparing methods, ptychography provides superior accuracy in determining layer thickness, even for stacks of multiple materials, using an extended scattering quotient. These measurement and analysis concepts thus provide a nondestructive way to accurately extract information on the material composition and layer thicknesses of complex nanostructured samples.