Temporal and spatial reactors for atomic layer deposition on particles

van Ommen, J. Ruud; Grillo, F.; Valdesueiro Gonzalez, D; Kooijman, DJ; Talebi, M.; Goulas, A.

Temporal and spatial reactors for atomic layer deposition on particles

Abstract (2014)

Authors

J. Ruud van Ommen ChemE/Product and Process Engineering

F. Grillo ChemE/Product and Process Engineering

D Valdesueiro Gonzalez ChemE/Product and Process Engineering

DJ Kooijman External organisation

M. Talebi ChemE/O&O groep, ChemE/Product and Process Engineering

A. Goulas ChemE/Product and Process Engineering

Research Group

ChemE/Product and Process Engineering

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Published Date

2014

Language

English

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Research Group

ChemE/Product and Process Engineering

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