Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials
Journal Article
(2015)
Author(s)
G Fiorentino (TU Delft - Electronic Components, Technology and Materials)
B Morana (TU Delft - Electronic Components, Technology and Materials)
S Forte (External organisation)
Lina Sarro (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1116/1.4904208
To reference this document use:
https://resolver.tudelft.nl/uuid:e6cb30a7-7008-4e7c-ad76-2f9683361dbe
More Info
expand_more
expand_more
Publication Year
2015
Language
English
Research Group
Electronic Components, Technology and Materials
Issue number
art. 01A142
Volume number
33
Pages (from-to)
1-9
No files available
Metadata only record. There are no files for this record.