Crystallographic silicon-etching for ultra-high aspect-ratio FinFET
Conference Paper
(2008)
Author(s)
V Jovanovi¿ (External organisation)
T Suligoj (External organisation)
L.K. Nanver (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:eb023fc7-266d-414c-a8a1-947014d7619a
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Publication Year
2008
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
313-320
ISBN (print)
978-1-56677-626-4
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