Crystallographic silicon-etching for ultra-high aspect-ratio FinFET

Conference paper (2008)

Authors

V Jovanovi¿ External organisation
T Suligoj External organisation
L.K. Nanver Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2008

Language

Undefined/Unknown

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials