Reactive Ion Etchin of metal stack consisting of an aluminium ally, WGe barrier and Ti adhesion layer
Journal Article
(1997)
Author(s)
E Sabouret (External organisation)
C Schaffnit (External organisation)
JF Jongste (External organisation)
GCAM Janssen (TU Delft - OLD Metals Processing, Microstructures and Properties)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
OLD Metals Processing, Microstructures and Properties
To reference this document use:
https://resolver.tudelft.nl/uuid:eb0943fd-d42e-45e4-9026-4d8a21babf8c
More Info
expand_more
expand_more
Publication Year
1997
Research Group
OLD Metals Processing, Microstructures and Properties
Volume number
37/38
Pages (from-to)
353-363
No files available
Metadata only record. There are no files for this record.