A study of reactive ion etching damage effects in GaN.
Journal Article
(2001)
Author(s)
B Rong (TU Delft - QN/Kavli Nanolab Delft)
RJ Reeves (External organisation)
SA Brown (External organisation)
MM Alkaisi (External organisation)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
R Cheung (External organisation)
W.G. Sloof (TU Delft - OLD Virtual Materials and Mechanics)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:ee137677-0dfe-4c22-9f9e-73dbf254a52c
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Bibliographical Note
25% FCM, 75% DIMES@en
Volume number
57-58
Pages (from-to)
585-591
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