Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
Albert Santoso (TU Delft - ChemE/Product and Process Engineering)
Afke Damen (Student TU Delft)
J. Ruud van Ommen (TU Delft - ChemE/Product and Process Engineering)
Volkert van Steijn (TU Delft - ChemE/Product and Process Engineering)
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Abstract
We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.
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