Afke Damen

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Journal article (1)

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Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Journal article (2022) - Albert Santoso , Afke Damen , J. Ruud van Ommen , Volkert van Steijn

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmosph ...