Protecting patches in colloidal synthesis of Au semishells
Daniel Mann (DWI – Leibniz Institute for Interactive Materials e.V., RWTH Aachen University)
Stefanie Voogt (Zuyd University of Applied Sciences, RWTH Aachen University, DWI – Leibniz Institute for Interactive Materials e.V.)
Ryan van Zandvoort (TNO)
Helmut Keul (DWI – Leibniz Institute for Interactive Materials e.V., RWTH Aachen University)
Martin Möller (DWI – Leibniz Institute for Interactive Materials e.V., RWTH Aachen University)
Marcel Verheijen (Eindhoven University of Technology, Philips Innovation Labs)
Daniel Nascimento Duplat (TU Delft - ImPhys/Optics)
Man Xu (TNO, TU Delft - ImPhys/Optics)
Paul Urbach (TU Delft - ImPhys/Optics)
Aurele Adam (TU Delft - ImPhys/Optics)
Pascal Buskens (DWI – Leibniz Institute for Interactive Materials e.V., TNO, RWTH Aachen University, Zuyd University of Applied Sciences)
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Abstract
Protecting groups are commonly applied in multi-step molecular syntheses to protect one or multiple functional groups from reacting. After the reaction, they are removed from the molecule. In full analogy to this concept, we report the practical and scalable colloidal synthesis of Au semishells using polyphenylsiloxane protecting patches to prevent part of the surface of polystyrene nanoparticles from being covered with Au. After Au deposition, the patches are removed yielding Au semishells. We anticipate that this strategy can be extended to the synthesis of other types of non-centrosymmetric nanoparticles.