Control strategies for a dynamic positioning machine at nanometer level

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Abstract

A dynamic positioning machine for nanoscale engineering has been developed. The system comprises of a 2 DOF long range translation stage carrying a 6 DOF shorte tange stage. The long range stage can travese an area of 50 mmx50 mm while the shorte range stage can provide up to 17 micrometers of linear positioning and 160x10-6 radians of angular motion to compensate errors generated by the long range stage during traverses. Currently, positioning of the x- and y-axis along with angular motion about the z-axis is monitored by laser inerferometers, while positioning of the z-axis and angular motion of x- and y-axis are monitored by 3 capacitance gages.