Control of polarization in bulk ferroelectrics by mechanical dislocation imprint

Journal Article (2021)
Authors

Marion Höfling (Technische Universität Darmstadt)

Xiandong Zhou (Technische Universität Darmstadt)

Lukas M. Riemer (École Polytechnique Fédérale de Lausanne)

Enrico Bruder (Technische Universität Darmstadt)

Binzhi Liu (Iowa State University)

L. Zhou (Ames laboratory, Ames, Iowa State University)

P. Groszewicz (TU Delft - RST/Storage of Electrochemical Energy)

Fangping Zhuo (Technische Universität Darmstadt)

Bai Xiang Xu (Technische Universität Darmstadt)

G.B. More authors (External organisation)

Faculty
Industrial Design Engineering
To reference this document use:
https://doi.org/10.1126/science.abe3810
More Info
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Publication Year
2021
Language
English
Faculty
Industrial Design Engineering
Issue number
6545
Volume number
372
Pages (from-to)
961-964
DOI:
https://doi.org/10.1126/science.abe3810

Abstract

Defects are essential to engineering the properties of functional materials ranging from semiconductors and superconductors to ferroics. Whereas point defects have been widely exploited, dislocations are commonly viewed as problematic for functional materials and not as a microstructural tool. We developed a method for mechanically imprinting dislocation networks that favorably skew the domain structure in bulk ferroelectrics and thereby tame the large switching polarization and make it available for functional harvesting. The resulting microstructure yields a strong mechanical restoring force to revert electric field–induced domain wall displacement on the macroscopic level and high pinning force on the local level. This induces a giant increase of the dielectric and electromechanical response at intermediate electric fields in barium titanate [electric field–dependent permittivity (e33) ≈ 5800 and large-signal piezoelectric coefficient (d33*) ≈ 1890 picometers/volt]. Dislocation-based anisotropy delivers a different suite of tools with which to tailor functional materials.

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