Low Phase Noise RF Oscillators Based on Thin-Film Lithium Niobate Acoustic Delay Lines

Journal Article (2020)
Authors

Ming Huang Li (National Tsing Hua University)

Ruochen Lu (University of Illinois at Urbana Champaign)

Tomas Manzaneque Garcia (TU Delft - Dynamics of Micro and Nano Systems)

Songbin Gong (University of Illinois at Urbana Champaign)

Research Group
Dynamics of Micro and Nano Systems
To reference this document use:
https://doi.org/10.1109/JMEMS.2019.2961976
More Info
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Publication Year
2020
Language
English
Research Group
Dynamics of Micro and Nano Systems
Issue number
2
Volume number
29
Pages (from-to)
129-131
DOI:
https://doi.org/10.1109/JMEMS.2019.2961976

Abstract

An RF oscillator has been demonstrated using a wideband SH0 mode lithium niobate acoustic delay line (ADL). The design space of the ADL-based oscillators is theoretically investigated using the classical linear time-invariant (LTI) phase noise model. The analysis reveals that the key to low phase noise is low insertion loss (IL), large delay (τG), and high carrier frequency ( fo). Two SH0 ADL oscillators based on a single SH0 ADL ( fo = 157 MHz, IL = 3.2 dB, τG = 270ns) but with different loop amplifiers have been measured, showing low phase noise of -114 dBc/Hz and -127 dBc/Hz at 10-kHz offset with a carrier power level of -8 dBm and 0.5 dBm, respectively. These oscillators not only have surpassed other Lamb wave delay oscillators but also compete favorably with surface acoustic wave (SAW) delay line oscillators in performance. [2019-0223].

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