A high-current scanning electron microscope with multi-beam optics

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A high-current scanning electron microscope with multi-beam optics

Journal Article (2016)

Author(s)

Takashi Doi (TU Delft - ImPhys/Charged Particle Optics, Hitachi High-Technologies Co.)

Minoru Yamazaki (Hitachi High-Technologies Co., TU Delft - ImPhys/Charged Particle Optics)

Takashi Ichimura (TU Delft - ImPhys/Algemeen, Hitachi High-Technologies Co.)

Yan Ren (TU Delft - ImPhys/Charged Particle Optics)

P. Kruit (TU Delft - ImPhys/Charged Particle Optics)

Research Group

ImPhys/Charged Particle Optics

MEMS Multi-beam SEM (MBSEM) Scanning electron microscopy (SEM)

DOI related publication

https://doi.org/10.1016/j.mee.2016.02.055 Final published version

To reference this document use

https://resolver.tudelft.nl/uuid:f6f86381-0622-4cb8-a00b-a72a9212d9b3

More Info

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Publication Year

2016

Language

English

Research Group

ImPhys/Charged Particle Optics

Journal title

Microelectronic Engineering

Volume number

159

Pages (from-to)

132-138

Downloads counter

87

Abstract

Recently we have proposed a new Multi-beam Scanning Electron Microscope (MBSEM) which potentially offers a higher current than a single beam SEM. In this system the primary electron beam is first separated into 196 beams by an Aperture Lens Array and then focused into one single spot by using a second Micro Lens Array (MLA) in the objective lens. This system potentially offers high current (200 nA), medium resolution (50 nm), and low landing energy (500 eV) for inspection tool of semiconductor. Here we report that we have achieved a practical setup, evaluated its performance, found difficulties in operating such a system and we draw conclusions about our proposition.