Challenges for scanning electron microscopy and inspection on the nanometer scale for non-IC application

And how to tackle them using computational techniques

Conference paper (2017)

Authors

Jens Bolten AMICA
K.T. Arat ImPhys/Charged Particle Optics
Nezih Ünal GenISys GmbH
Max C. Lemme AMICA, Rheinisch-Westfälische Technische Hochschule
Research Group
ImPhys/Charged Particle Optics
Copyright: © 2017 Jens Bolten, K.T. Arat, Nezih Ünal, Caroline Porschatis, Thorsten Wahlbrink, Max C. Lemme
DOI: https://doi.org/10.1117/12.2279564
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Published Date

2017

Language

English

Reuse Rights

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Research Group

ImPhys/Charged Particle Optics

Abstract

In this paper key challenges posed on metrology by feature dimensions of 20nm and below are discussed. In detail, the need for software-based tools for SEM image acquisition and image analysis in environments where CD-SEMs are not available and/or not flexible enough to cover all inspection tasks is outlined. These environments include research at universities as well as industrial R and D environments focused on non-IC applications. The benefits of combining automated image acquisition and analysis with computational techniques to simulate image generation in a conventional analytical SEM with respect to the overall reliability, precision and speed of inspection will be demonstrated using real-life inspection tasks as demonstrators.

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