Challenges for scanning electron microscopy and inspection on the nanometer scale for non-IC application
And how to tackle them using computational techniques
Jens Bolten (AMICA)
K.T. Arat (TU Delft - ImPhys/Charged Particle Optics)
Nezih Ünal (GenISys GmbH)
Caroline Porschatis (AMICA)
Thorsten Wahlbrink (AMICA)
Max C. Lemme (RWTH Aachen University, AMICA)
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Abstract
In this paper key challenges posed on metrology by feature dimensions of 20nm and below are discussed. In detail, the need for software-based tools for SEM image acquisition and image analysis in environments where CD-SEMs are not available and/or not flexible enough to cover all inspection tasks is outlined. These environments include research at universities as well as industrial R and D environments focused on non-IC applications. The benefits of combining automated image acquisition and analysis with computational techniques to simulate image generation in a conventional analytical SEM with respect to the overall reliability, precision and speed of inspection will be demonstrated using real-life inspection tasks as demonstrators.