Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry

Šiaudinyte, L.; Pereira, S.F.

doi:10.1088/1361-6501/ab7315

Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry

Title

Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry

Author

Šiaudinyte, L. (TU Delft ImPhys/Optics)
Pereira, S.F. (TU Delft ImPhys/Optics)

Date

2020

Abstract

Optical inspection of periodic nanostructures is a major challenge in the semiconductor industry due to constantly decreasing critical dimensions. In this paper we combine coherent Fourier scatterometry (CFS) with a sectioning mask for subwavelength grating parameter determination. By selecting only the most sensitive regions of the scattered light in the Fourier plane, one can retrieve grating parameters faster and with higher sensitivity than previous approaches. Moreover, the full process of CFS using focused light is explained and implemented in a subwavelength grating regime. The results of using transverse magnetic polarized input fields together with the proposed sectioning mask are presented and compared to the non-mask case.

Subject

beam shaping
coherent Fourier scatterometry
diffraction
grating
optical inspection
periodic nanostructure
scattered light

To reference this document use:

http://resolver.tudelft.nl/uuid:0d9be0a1-03e0-4642-b9af-e5d4d4fee635

DOI

https://doi.org/10.1088/1361-6501/ab7315

ISSN

0957-0233

Source

Measurement Science and Technology, 31 (10)

Part of collection

Institutional Repository