Print Email Facebook Twitter 3D Rigorous simulation of mask induced polarization Title 3D Rigorous simulation of mask induced polarization Author Wei, X. Urbach, H.P. Wachters, A. Aksenov, Y. Faculty Applied Sciences Department Optical Research Groep Date 2005-05-12 Abstract The polarization induced by the mask is studied by using a 3D rigorous model, wich solves Maxwell equations using the finite element method. Teh aerial image depends strongly on the change of polarization induced by the materials, thickness of the layer and pitch of the periodic masks. Subject high NApolarizationmask topographyrigourous simulation3D modeling To reference this document use: http://resolver.tudelft.nl/uuid:60310ee3-3531-4b85-bc02-40185e536622 Publisher SPIE ISSN 0277-786X Source Proceedings of SPIE, 2004 vol. 5754 Part of collection Institutional Repository Document type conference paper Rights (c)2004 Wie, X., Urbach, H.P., Wachters, A., Aksenov, Y. Files PDF 3DWei.pdf 1.02 MB Close viewer /islandora/object/uuid:60310ee3-3531-4b85-bc02-40185e536622/datastream/OBJ/view