Electron beam lithography on curved or tilted surfaces

Electron beam lithography on curved or tilted surfaces: Simulations and experiments

Arat, K.T. (TU Delft ImPhys/Charged Particle Optics)
Zonnevylle, A.C. (Raith, Best)
Ketelaars, Wilhelmus S.M.M. (Raith, Best)
Belic, Nikola (GenISys GmbH)
Hofmann, Ulrich (GenISys GmbH)
Hagen, C.W. (TU Delft ImPhys/Charged Particle Optics)

2019

There is a growing interest for patterning on curved or tilted surfaces using electron beam lithography. Computational proximity correction techniques are well established for flat surfaces and perpendicular exposure, but for curved and tilted surfaces adjustments are needed as the dose distribution is no longer cylindrically symmetric with respect to the surface normal. A graphical processing unit -accelerated 3D Monte Carlo simulation, based on first-principle scattering models, is used to simulate the asymmetric dose distribution. Based on that, an approximate adjustment is made to an existing high-performance proximity effect correction (PEC) algorithm aimed at the correct exposure of a pattern of nanowires on a 17° tilted surface. It was experimentally verified that using the adjusted PEC indeed leads to a more uniform exposure on tilted surfaces.

http://resolver.tudelft.nl/uuid:7d3abb1a-a971-4d3b-b302-7801ddc3061f

https://doi.org/10.1116/1.5120632

2020-03-01

2166-2746

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 37 (5)

Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.

Institutional Repository

journal article

© 2019 K.T. Arat, A.C. Zonnevylle, Wilhelmus S.M.M. Ketelaars, Nikola Belic, Ulrich Hofmann, C.W. Hagen