Print Email Facebook Twitter Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering Title Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering Author Rafieian, Damon (University of Twente) Ogieglo, Wojciech (University of Twente) Savenije, T.J. (TU Delft ChemE/Opto-electronic Materials) Lammertink, Rob G H (University of Twente) Date 2015-09-01 Abstract We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx), obtained by sputtering at relatively low oxygen concentration, formed rutile upon annealing in air, whereas stoichiometric films formed anatase. This route therefore presents a formation route for rutile films via lower ( To reference this document use: http://resolver.tudelft.nl/uuid:c8df094d-7a09-4c2d-958e-590adc0bbe62 DOI https://doi.org/10.1063/1.4931925 ISSN 2158-3226 Source AIP Advances, 5 (9) Part of collection Institutional Repository Document type journal article Rights © 2015 Damon Rafieian, Wojciech Ogieglo, T.J. Savenije, Rob G H Lammertink Files PDF 1.4931925.pdf 551.32 KB Close viewer /islandora/object/uuid:c8df094d-7a09-4c2d-958e-590adc0bbe62/datastream/OBJ/view