Print Email Facebook Twitter Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS Title Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS Author Santoso, A. (TU Delft ChemE/Product and Process Engineering) Damen, Afke (Student TU Delft) van Ommen, J.R. (TU Delft ChemE/Product and Process Engineering) van Steijn, V. (TU Delft ChemE/Product and Process Engineering) Date 2022 Abstract We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS. To reference this document use: http://resolver.tudelft.nl/uuid:f1032a9e-2825-452c-ba3c-879e6d291ced DOI https://doi.org/10.1039/d2cc02402k ISSN 1359-7345 Source Chemical Communications, 58 (77), 10805-10808 Part of collection Institutional Repository Document type journal article Rights © 2022 A. Santoso, Afke Damen, J.R. van Ommen, V. van Steijn Files PDF d2cc02402k.pdf 898.71 KB Close viewer /islandora/object/uuid:f1032a9e-2825-452c-ba3c-879e6d291ced/datastream/OBJ/view