Print Email Facebook Twitter Method of manufacturing nanochannels and nanochannels thus fabricated Title Method of manufacturing nanochannels and nanochannels thus fabricated Author Kutchoukov, V.G. Bossche, A. Laugere, F. Van der Vlist, W. Faculty Electrical Engineering, Mathematics and Computer Science Date 2005-02-10 Abstract The present invention relates to a method of fabricating at least one nanochannel in a semiconductor material applied on a substrate, comprising t he semiconductor material being subjected to an etching treatment and said substrate to a bonding treatment so as to attach a covering layer to the substrate, in which bonding treatment the semiconductor material is applied as bonding agent, and wherein prior to etching, the semiconductor material is locally doped for the formation of electrodes. To reference this document use: http://resolver.tudelft.nl/uuid:47ac50b0-27b6-4a03-be8e-b5f201acedc6 Publisher European Patent Office Source WO 2005012159 (A1) Is part of http://v3.espacenet.com/publicationDetails/biblio?CC=WO&NR=2005012159A1&KC=A1&FT=D&date=20050210&DB=&locale=en_EP Part of collection Institutional Repository Document type patent Rights (c) 2005 The Author(s) Files PDF WO2005012159A1.pdf 439.88 KB Close viewer /islandora/object/uuid:47ac50b0-27b6-4a03-be8e-b5f201acedc6/datastream/OBJ/view