Rectification in Ionic Field Effect Transistors Based on Single Crystal Silicon Nanopore

Title

Rectification in Ionic Field Effect Transistors Based on Single Crystal Silicon Nanopore

 Author

Hong, H. (TU Delft Electronic Components, Technology and Materials; Tsinghua University)
Lei, Xin (Beihang University)
Wei, Jiangtao (Tsinghua University)
Zhang, Yang (Beijing Jiaotong University)
Zhang, Yulong (Tsinghua University)
Sun, Jianwen (Tsinghua University)
Zhang, Kouchi (TU Delft Electronic Components, Technology and Materials) ORCID 0000-0002-8023-5170
Sarro, Pasqualina M (TU Delft Electronic Components, Technology and Materials) ORCID 0000-0002-2766-0880
Liu, Zewen (Tsinghua University)

Date

2024

 Abstract

Ionic FETs have enormous potential for energy conversion, sensing, and ionic circuits due to their efficient regulation of the nanochannel. Here ionic FETs based on single-crystal silicon nanopores and the rectification of the fabricated devices are studied. The electrical characterization results demonstrated that since the silicon-based nanopores have the advantage of modulating the surface charge due to their semiconductor nature and benefitting from the effective 3D gating effect on the nanochannel, the magnitude and polarity of surface charge can be modulated by the gate voltage. The rectification effect can be adjusted by applying a certain voltage and fulfilling a transition between anion selectivity and cation selectivity when the surface charge polarity is reversed. Moreover, current–voltage characteristics of the reported ionic FET can be switched between ohmic and diode-like regimes. The proposed ionic FETs supply a novel platform to study the ionic properties and have great potential to be applied in large-scale ionic circuits due to their excellent performance. Finally, simulation results prove the surface charge modulated by the gate voltage determines the magnitude and direction of rectification, which is consistent with the reported experiment result.


 Subject

gate voltage
Ionic FET
rectification
silicon nanopore
surface charge

 To reference this document use:

http://resolver.tudelft.nl/uuid:6ce3e8d8-7dbf-4519-befb-d7cc0a26fc86

 DOI

https://doi.org/10.1002/aelm.202300782

 Source

Advanced Electronic Materials

 Part of collection

Institutional Repository

 Document type

journal article

 Rights

© 2024 H. Hong, Xin Lei, Jiangtao Wei, Yang Zhang, Yulong Zhang, Jianwen Sun, Kouchi Zhang, Pasqualina M Sarro, Zewen Liu
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