Low Temperature PureB Technology for CMOS Compatible Photodetectors

In this thesis, conventional high temperature (HT, 700 °C) PureB technology is optimized in order to fabricate detectors with improved key parameters such as the spatial uniformity of the responsivity. A novel technology for low temperature (LT, 400 °C) boron deposition is developed providing a uniform, smooth, closed LT boron layer. This...

Chemical vapor deposition of graphene: A route to device integration

In this thesis, I have shown that the quality of synthetic graphene can be as high as mechanically exfoliated graphene if we can get rid of the wrinkles. Any defects, impurities and grain boundaries will induce scattering, preventing ballistic transport. The experiment described in chapter 4 was the first to demonstrate ballistic transport in...

Efficient numerical methods for the instationary solution of laminar reacting gas flow problems

In production processes of micro-electronics, optical and mechanical coatings and solar cells, high-purity materials in the form of a powder or a thin film are significant importance. The deposition of thin films on irregularly shaped surfaces can be done by chemical vapor deposition (CVD). Computer simulations are widely used to design CVD...

Expanding thermal plasma deposition of hydrogenated amorphous silicon for solar cells

Abstract not available

Novel contacts and diodes for advanced silicon technology