Electron beam-induced deposition of platinum from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

Two platinum precursors, Pt(CO)₂Cl₂ and Pt(CO)₂Br₂, were designed for focused electron beam-induced deposition (FEBID) with the aim of producing platinum deposits of higher purity than those deposited from commercially available precursors. In this work, we present the first deposition experiments...

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Using three different precursors [MeCpPtMe3, Pt(PF3)4, and W(CO)6], an ultra-high vacuum surface science approach has been used to identify and rationalize the effects of substrate temperature and electron fluence on the chemical composition and bonding in films created by electron beam induced deposition (EBID). X-ray photoelectron spectroscopy...

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Focused electron beam induced processing (FEBIP) of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor’s ligand...

Electron beam irradiation of dimethyl-(acetylacetonate) gold(III) adsorbed onto solid substrates

Electron beam induced deposition of organometallic precursors has emerged as an effective and versatile method for creating two-dimensional and three-dimensional metal-containing nanostructures. However, to improve the properties and optimize the chemical composition of nanostructures deposited in this way, the electron stimulated decomposition...

Electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV): Total cross section as a function of incident electron energy

The total cross section has been measured for the electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV) [MeCpPt(IV)Me3], a Pt precursor often used in focused electron beam induced processing (FEBIP), for incident electron energies ranging between 3–3 keV. Measurements were performed for the precursor in the adsorbed...