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Hong, H. (author), Ye, Li (author), Li, Ke (author), Sarro, Pasqualina M (author), Zhang, Kouchi (author), Liu, Zewen (author)In this paper, we report a modified three step anisotropic wet etching (TSWE) method to fabricate solid-state silicon nanoslits. The slit-opening process is performed by <111> crystal plane etching. The etching rate of the <111> crystal plane is reasonably slow as it is only 1/45 of the <100> etching rate, thus allowing and...conference paper 2021
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