Optimization of a plasma etching machine for failure analysis of semiconductors

Microwave Induced Plasma (MIP) is an advanced decapsulation tool developed by Jiaco Instruments. The goal of this thesis is to optimise the current MIP system. There are two directions: 1. Improve the etching rate. 2. Find selectivity between different materials (Si, SiO2, SiN). The experiments are divided into two parts in total, improved...