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Dwivedi, P. (author), Pereira, S.F. (author), Urbach, Paul (author)Wavefront aberration measurements are required to test an extreme ultraviolet (EUV) imaging system. For a high-NA EUV imaging system, where conventional wavefront-sensing techniques show limitations, ptychography can be used for this purpose. However, at the wavelength region of EUV (i.e., 13.5 nm), the position accuracy of the scanning mask...journal article 2019