Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applications

TiO2 is an interesting and promising material for micro-/nanoelectromechanical systems (MEMS/NEMS). For high performance and reliable MEMS/NEMS, optimization of the optical characteristics, mechanical stress, and especially surface smoothness of TiO2 is required. To overcome the roughness issue of the TiO2 films due to crystallization during...

Microstructures and the corresponding magnetic properties of half-doped Nd0.5Sr0.5MnO3 films

The microstructural and magnetic properties of amorphous, nanoclustered, and self-organized bilayer Nd0.5Sr0.5MnO3 films, prepared by rf magnetron sputtering, are investigated. The amorphous film was found to be a typical paramagnet with free motion of the individual Mn spins, and the magnetic properties are well described on the basis of the...

Fabrication of in situ ultrathin anodic aluminum oxide layers for nanostructuring on silicon substrate

The authors demonstrate a method for the fabrication of in situ ultrathin porous anodic aluminum oxide layers (aspect ratio<2:1) on Si, which can be directly used as templates for nanodot preparation and for pattern transfer. The regular shape of the aluminum oxide pores is maintained even when the thickness of the aluminum oxide template is...