Ahvenniemi, Esko (author), Akbashev, Andrew R. (author), Ali, Saima (author), Bechelany, Mikhael (author), Berdova, Maria (author), Boyadjiev, Stefan (author), Cameron, David C. (author), Chen, R. (author), Chubarov, Mikhail (author), Cremers, Veronique (author), Devi, Anjana (author), Drozd, Viktor (author), Elnikova, Liliya (author), Gottardi, Gloria (author), Grigoras, Kestutis (author), Hausmann, Dennis M. (author), Hwang, Cheol Seong (author), Jen, Shih Hui (author), Kallio, Tanja (author), Kanervo, Jaana (author), Khmelnitskiy, Ivan (author), Kim, Do Han (author), Klibanov, Lev (author), Koshtyal, Yury (author), Krause, A. Outi I (author), Kuhs, Jakob (author), Kärkkänen, Irina (author), Kääriäinen, Marja Leena (author), Kääriäinen, Tommi (author), Lamagna, Luca (author), Łapicki, Adam A. (author), Leskelä, Markku (author), Lipsanen, Harri (author), Lyytinen, Jussi (author), Malkov, Anatoly (author), Malygin, Anatoly (author), Mennad, Abdelkader (author), Militzer, Christian (author), Molarius, Jyrki (author), Norek, Małgorzata (author), Özgit-Akgün, Çaǧla (author), Panov, Mikhail (author), Pedersen, Henrik (author), Piallat, Fabien (author), Popov, Georgi (author), Puurunen, Riikka L. (author), Rampelberg, Geert (author), Ras, Robin H A (author), Rauwel, Erwan (author), Roozeboom, Fred (author), Sajavaara, Timo (author), Salami, Hossein (author), Savin, Hele (author), Schneider, Nathanaelle (author), Seidel, Thomas E. (author), Sundqvist, Jonas (author), Suyatin, Dmitry B. (author), Törndahl, Tobias (author), van Ommen, J.R. (author), Wiemer, Claudia (author), Ylivaara, Oili M E (author), Yurkevich, Oksana (author) Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and...
review 2017
