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Kutchoukov, V.G. (author), Bossche, A. (author), Laugere, F. (author), Van der Vlist, W. (author)The present invention relates to a method of fabricating at least one nanochannel in a semiconductor material applied on a substrate, comprising t he semiconductor material being subjected to an etching treatment and said substrate to a bonding treatment so as to attach a covering layer to the substrate, in which bonding treatment the...patent 2005