Correction: Study on the controllability of the fabrication of single-crystal silicon nanopores/nanoslits with a fast-stop ionic current-monitored TSWE method (Microsystems & Nanoengineering, (2023), 9, 1, (63), 10.1038/s41378-023-00532-0)

Correction to: Microsystems & Nanoengineering published online 16 May 2023 Correction Following publication of the original article¹, it was noticed that the phrase ‘DNA sequencing’ is incorrect, which should be replaced by ‘biosensing’. The original paper has been updated.

Nanoprobes for PET/MR Imaging

The development of clinical imaging techniques significantly improves diagnostic accuracy and provides guidance for personalized treatment of individuals. However, every single imaging modality has its distinct drawbacks that cannot fully fulfil the diagnosis requirement. Thus, rational combination of different imaging modalities can achieve...

Study on the controllability of the fabrication of single-crystal silicon nanopores/nanoslits with a fast-stop ionic current-monitored TSWE method

The application of single-crystal silicon (SCS) nanopore structures in single-molecule-based analytical devices is an emerging approach for the separation and analysis of nanoparticles. The key challenge is to fabricate individual SCS nanopores with precise sizes in a controllable and reproducible way. This paper introduces a fast-stop ionic...

Supplementary control based on current source coupling for improving dynamic characteristics of active distribution network

Supplementary control (SC) technology is widely leveraged by power supply companies in active distribution networks (ADNs) to improve their stability and dynamic characteristics. Yet, the existed SCs are generally implemented from inside the converter controllers of distributed generators (DGs) or active loads, so there is a need to redesign...

A silicon MEMS structure for characterization of femto-farad-level capacitive sensors with lock-in architecture

This paper presents a silicon MEMS capacitive structure to investigate a test methodology for fF-level capacitive sensors’ measurement. The device mimics a capacitive sensor with a changing intermediate layer between the electrodes. A single mask bulk micromachining process is used to fabricate the device, which has a nominal capacitance of 1.2...