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Grachev, S.Y. (author), Tichelaar, F.D. (author), Janssen, G.C.A.M. (author)We studied the tensile stress and grain-width evolution in sputter-deposited Cr films with thickness from 20?nm to 2.7??m. Films were deposited in an industrial Hauzer 750 physical vapor deposition machine at 50–80?°C. The films exhibited a columnar microstructure. A power law behavior of the tensile stress as well as of the average grain width...journal article 2005
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Pujada, B.R. (author), Tichelaar, F.D. (author), Arnoldbik, W.M. (author), Sloof, W.G. (author), Janssen, G.C.A.M. (author)Growth stress in tungsten carbide-diamond-like carbon coatings, sputter deposited in a reactive argon/acetylene plasma, has been studied as a function of the acetylene partial pressure. Stress and microstructure have been investigated by wafer curvature and transmission electron microscopy (TEM) whereas composition and energy distribution...journal article 2009