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document
Duc, T.C. (author), Wei, J. (author), Sarro, P.M. (author), Lau, G.K. (author)
conference paper 2007
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Duc, T.C. (author), Wei, J. (author), Sarro, P.M. (author), Lau, G.K. (author)
conference paper 2007
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Zhang, B. (author), Wei, J. (author), Bottger, A.J. (author), van Zeijl, H.W. (author), Sarro, Pasqualina M (author), Zhang, Kouchi (author)
We report the design, fabrication and experimental investigation of a MEMS micro-hotplate (MHP) for fast time-resolved X-ray diffraction (TRXRD) study of Cu nanoparticle paste (nanoCu paste) sintering process. The device and its system are designed to have a 60 ms minimum time interval, uniform temperature distribution and variant gas...
conference paper 2019
document
Verhaar, T.M. (author), Wei, J. (author), Sarro, P.M. (author)
In this paper, a process to realize metal lines on the sidewall of high aspect ratio cavities is developed. As an alternative to conventional photoresist, SU8 is used to define patterns on vertical sidewalls of deep cavities while maintaining compatibility with conventional IC processes. When transferring a pattern onto a 3D structure,...
journal article 2009
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Wei, J. (author), Ye, H. (author), Van Zeijl, H.W. (author), Sarro, P.M. (author), Zhang, G.Q. (author)
A micro-electro-mechanical-system (MEMS) based, temperature triggered, switch is developed as a cost-effective solution for smart cooling control of solid-state-lighting systems. The switch (1.0x0.4 mm2) is embedded in a silicon substrate and fabricated with a single-mask 3D micro-machining process. The device switches on at a designed...
journal article 2012
document
Van Zeijl, H.W. (author), Wei, J. (author), Shen, C. (author), Verhaar, T.M. (author), Maury, P. (author), Sarro, P.M. (author)
Lithography for IC device fabrication is a high volume high accuracy production technology. Such production characteristics are also attractive for MEMS and 3 dimensional (3D) integration processes. However, advanced lithography has a strong 2 dimensional (2D) nature and is not optimized to fabricate 3D structures. In this work, 5 exposure and...
journal article 2010
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Van Zeijl, H.W. (author), Wei, J. (author), Shen, C. (author), Verhaar, T.M. (author), Sarro, P.M. (author)
Lithography as developed for IC device fabrication is a high volume high accuracy patterning technology with strong 2 dimensional (2D) characteristics. This 2D nature makes it a challenge to integrate this technology in a 3 dimensional (3D) manufacturing environment. This article addresses the performance of a waferstepper (ASML PAS5000) in...
journal article 2010
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Wei, J. (author), Chen, Z.L. (author), Liu, Z.W. (author), Sarro, P.M. (author)
This paper presents a silicon MEMS capacitive structure to investigate a test methodology for fF-level capacitive sensors’ measurement. The device mimics a capacitive sensor with a changing intermediate layer between the electrodes. A single mask bulk micromachining process is used to fabricate the device, which has a nominal capacitance of 1.2...
journal article 2010
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Estevez, P. (author), Bank, J. (author), Porta, M. (author), Wei, J. (author), Sarro, P.M. (author), Tichem, M. (author), Staufer, U. (author)
This paper presents the design, fabrication and characterization of a piezoresistive 6 Degrees of Freedom (DOF) force and torque sensor to be used in micro-manipulation. The mechanical structure of the device consists of 7 suspended beams and a calibration structure, which can be replaced by micro-manipulation tools such as micro-grippers or...
journal article 2011
document
Wei, J. (author), Magnani, S. (author), Sarro, P.M. (author)
This paper presents a submicron suspended piezoresistive silicon-beam structure as a basic sensing element to replace the conventional piezoresistors, so to improve the detection sensitivity. The alternative element benefits from the increase of the induced stress, which is locally concentrated on the suspended submicron beam. This approach...
journal article 2011
document
Hong, H. (author), Wei, Jiangtao (author), Lei, Xin (author), Chen, Haiyun (author), Sarro, Pasqualina M (author), Zhang, Kouchi (author), Liu, Zewen (author)
Correction to: Microsystems &amp; Nanoengineering published online 16 May 2023 Correction Following publication of the original article<sup>1</sup>, it was noticed that the phrase ‘DNA sequencing’ is incorrect, which should be replaced by ‘biosensing’. The original paper has been updated.
journal article 2023
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Li, X. (author), Wei, L. (author), Poelma, René H. (author), Vollebregt, S. (author), Wei, J. (author), Urbach, Paul (author), Sarro, Pasqualina M (author), Zhang, Kouchi (author)
This paper presents a tuneable binary amplitude Fresnel lens produced by wafer-level microfabrication. The Fresnel lens is fabricated by encapsulating lithographically defined vertically aligned carbon nanotube (CNT) bundles inside a polydimethyl-siloxane (PDMS) layer. The composite lens material combines the excellent optical absorption...
journal article 2016
document
Hong, H. (author), Wei, Jiangtao (author), Lei, Xin (author), Chen, Haiyun (author), Sarro, Pasqualina M (author), Zhang, Kouchi (author), Liu, Zewen (author)
The application of single-crystal silicon (SCS) nanopore structures in single-molecule-based analytical devices is an emerging approach for the separation and analysis of nanoparticles. The key challenge is to fabricate individual SCS nanopores with precise sizes in a controllable and reproducible way. This paper introduces a fast-stop ionic...
journal article 2023
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