Sidewall angle tuning in focused electron beam-induced processing

Structures fabricated using focused electron beam-induced deposition (FEBID) have sloped sidewalls because of the very nature of the deposition process. For applications this is highly undesirable, especially when neighboring structures are interconnected. A new technique combining FEBID and focused electron beam-induced etching (FEBIE) has...

Feasibility Study of Schottky Emitter Arrays

In this thesis an attempt is made to make a step forward in the development of next a generation scanning electron lithography machine for sub 25nm chip making. One of the challenges for such a system is to have sufficient beam-lets with enough current for parallel writing which requires a sufficiently bright electron source. Since the present...