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Benettin, Paolo (author), Rodriguez, Nicolas B. (author), Sprenger, Matthias (author), Kim, Minseok (author), Klaus, Julian (author), Harman, Ciaran J. (author), van der Velde, Ype (author), Hrachowitz, M. (author), Botter, Gianluca (author)
Water transit time is now a standard measure in catchment hydrological and ecohydrological research. The last comprehensive review of transit time modeling approaches was published 15+ years ago. But since then the field has largely expanded with new data, theory and applications. Here, we review these new developments with focus on water-age...
review 2022
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Lekkala, Malakonda Reddy (author), Latheef, Mohamed (author), Jung, Jae Hwan (author), Coraddu, A. (author), Zhu, Hongjun (author), Srinil, Narakorn (author), Lee, Byung Hyuk (author), Kim, Do Kyun (author)
The application of unsteady incompressible flow phenomenon over the bluff bodies has received the attention of many researchers due to the rich and complex physics underpinning these flows, and thus requiring special attention in their modelling and numerical simulations. The wake that forms at the leeside of the bluff body is of particular...
review 2022
document
Ahvenniemi, Esko (author), Akbashev, Andrew R. (author), Ali, Saima (author), Bechelany, Mikhael (author), Berdova, Maria (author), Boyadjiev, Stefan (author), Cameron, David C. (author), Chen, R. (author), Chubarov, Mikhail (author), Cremers, Veronique (author), Devi, Anjana (author), Drozd, Viktor (author), Elnikova, Liliya (author), Gottardi, Gloria (author), Grigoras, Kestutis (author), Hausmann, Dennis M. (author), Hwang, Cheol Seong (author), Jen, Shih Hui (author), Kallio, Tanja (author), Kanervo, Jaana (author), Khmelnitskiy, Ivan (author), Kim, Do Han (author), Klibanov, Lev (author), Koshtyal, Yury (author), Krause, A. Outi I (author), Kuhs, Jakob (author), Kärkkänen, Irina (author), Kääriäinen, Marja Leena (author), Kääriäinen, Tommi (author), Lamagna, Luca (author), Łapicki, Adam A. (author), Leskelä, Markku (author), Lipsanen, Harri (author), Lyytinen, Jussi (author), Malkov, Anatoly (author), Malygin, Anatoly (author), Mennad, Abdelkader (author), Militzer, Christian (author), Molarius, Jyrki (author), Norek, Małgorzata (author), Özgit-Akgün, Çaǧla (author), Panov, Mikhail (author), Pedersen, Henrik (author), Piallat, Fabien (author), Popov, Georgi (author), Puurunen, Riikka L. (author), Rampelberg, Geert (author), Ras, Robin H A (author), Rauwel, Erwan (author), Roozeboom, Fred (author), Sajavaara, Timo (author), Salami, Hossein (author), Savin, Hele (author), Schneider, Nathanaelle (author), Seidel, Thomas E. (author), Sundqvist, Jonas (author), Suyatin, Dmitry B. (author), Törndahl, Tobias (author), van Ommen, J.R. (author), Wiemer, Claudia (author), Ylivaara, Oili M E (author), Yurkevich, Oksana (author)
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and...
review 2017