Spatial resolution limits in electron-beam-induced deposition

Electron-beam-induced deposition (EBID) is a versatile micro- and nanofabrication technique based on electron-induced dissociation of metal-carrying gas molecules adsorbed on a target. EBID has the advantage of direct deposition of three-dimensional structures on almost any target geometry. This technique has occasionally been used in focused...

Direct fabrication of nanowires in an electron microscope

Electron-beam-induced deposition (EBID) is a potentially fast and resistless deposition technique which might overcome the fundamental resolution limits of conventional electron-beam lithography. We advance the understanding of the EBID process by simulating the structure growth. The merit of our model is that it explains the shapes of...