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Determination of resist parameters using the extended Nijboer-Zernike theory
Complex pupil function reconstruction at high numerical aperture using the extended Nijboer-Zernike diffraction theory
Aberration retrieval for high-NA optical systems using the Extended Nijboer-Zernike theory
Extended Nijboer–Zernike approach to aberration and birefringence retrieval in a high-numerical-aperture optical system
Estimating resist parameters in optical lithography using the extended Nijboer-Zernike theory
Aerial image based lens metrology for wafer steppers
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