- document
-
Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Matsuyama, T. (author), Noda, T. (author)Phase Measurement Interferometers (PMI) are widely used during the manufacturing process of high quality lenses. Although they have an excellent reproducibility and sensitivity, the set-up is expensive and the accuracy of the measurement needs to be checked frequently. This paper discusses an alternative lens metrology method that is based on an...conference paper 2006
- document
- Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author) journal article 2006
- document
- Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwesteijn, A. (author) conference paper 2005
- document
-
Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Kwinten, H. (author), Van Steenwinckel, D. (author)This study presents an experimental method to determine the resist parameters that are at the origin of a general blurring of the projected aerial image. The resist model includes the effects of diffusion in the horizontal plane and a second cause for image blur that originates from a stochastic variation of the focus parameter. The used...conference paper 2004