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Searched for: author%3A%22Braat%2C+J.J.M.%22
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Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design
Braat, J.J.M. (author), Nugrowati, A.M. (author), Van de Nes, A.S. (author), Pereira, S.F. (author)
Poster presentation Optics Research Group TU Delft
journal article 2005
