Puce, Salvatore (author), Sciurti, Elisa (author), Rizzi, Francesco (author), Spagnolo, Barbara (author), Qualtieri, Antonio (author), De Vittorio, Massimo (author), Staufer, U. (author) This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by exploiting Two-Photon Polymerization (2PP) in an IP-L/SU-8 double layer resist system. The process consists of the sequential deposition of two different resists, such as SU-8 and IPL, onto the same glass substrate, followed by 2PP lithography...
journal article 2019
