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't Hart, P.A. (author), Babaie, M. (author), Vladimirescu, A. (author), Sebastiano, F. (author)
This work presents a self-heating study of a 40-nm bulk-CMOS technology in the ambient temperature range from 300 K down to 4.2 K. A custom test chip was designed and fabricated for measuring both the temperature rise in the MOSFET channel and in the surrounding silicon substrate, using the gate resistance and silicon diodes as sensors,...
journal article 2021
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't Hart, P.A. (author), Babaie, M. (author), Charbon-Iwasaki-Charbon, E. (author), Vladimirescu, A. (author), Sebastiano, F. (author)
This paper presents a device matching study of a commercial 40-nm bulk CMOS technology operated at cryogenic temperatures. Transistor pairs and linear arrays, optimized for device matching, were characterized over the temperature range from 300 K down to 4.2 K. The device parameters relevant for mismatch, i.e., the threshold voltage and the...
journal article 2020
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Incandela, R.M. (author), Song, L (author), Homulle, Harald (author), Charbon-Iwasaki-Charbon, E. (author), Vladimirescu, A. (author), Sebastiano, F. (author)
Cryogenic characterization and modeling of two nanometer bulk CMOS technologies (0.16-μm and 40-nm) are presented in this paper. Several devices from both technologies were extensively characterized at temperatures of 4 K and below. Based on a detailed understanding of the device physics at deep-cryogenic temperatures, a compact...
journal article 2018