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Sun, Y. (author), Kang, Xuanwu (author), Zheng, Yingkui (author), Wei, Ke (author), Li, Pengfei (author), Wang, Wenbo (author), Liu, Xinyu (author), Zhang, Kouchi (author)The optimization of mesa etch for a quasi-vertical gallium nitride (GaN) Schottky barrier diode (SBD) by inductively coupled plasma (ICP) etching was comprehensively investigated in this work, including selection of the etching mask, ICP power, radio frequency (RF) power, ratio of mixed gas, flow rate, and chamber pressure, etc. In particular...journal article 2020
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Liu, Jikai (author), Gaynor, Andrew T. (author), Chen, Shikui (author), Kang, Zhan (author), Suresh, Krishnan (author), Takezawa, Akihiro (author), Li, Lei (author), Kato, Junji (author), Tang, Jinyuan (author), Wang, C.C. (author), Cheng, Lin (author), Liang, Xuan (author), To, Albert. C. (author)Manufacturing-oriented topology optimization has been extensively studied the past two decades, in particular for the conventional manufacturing methods, for example, machining and injection molding or casting. Both design and manufacturing engineers have benefited from these efforts because of the close-to-optimal and friendly-to-manufacture...journal article 2018